Cabot Supermetals Opens Thin Films Manufacturing Facility in Etna, Ohio
Cabot Supermetals announced the official opening of its new thin films manufacturing facility located in Etna, OH. The new 90,000 sq. ft. state-of- the-art facility produces tantalum sputtering targets for use in semiconductor, optics, magnetics and flat panel display applications. Cabot invested approximately $12 million to build the site that currently employs 20 people.
Thin films of tantalum metal enable the use of copper metal interconnections between transistors in electronic devices. Cabot's new sputtering target manufacturing facility is a hands-free, "lights out" environment that combines robotic material handling, dynamic scheduling and automated process control. This advanced system enables Cabot to produce a high volume of consistent targets on time and at lower costs.
The new Etna location manufactures complete target assemblies for use in thin film deposition systems. Processes in the Etna facility include metal joining, shaping, machining and surface finishing steps designed to prepare the materials for use in ultra-clean environments at leading semiconductor and other technology manufacturers around the world.
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