ChemFirst Inc. Announces Hydroxylamine Supply Update
JACKSON, Miss.--(BUSINESS WIRE)--Nov. 15, 2000--ChemFirst Inc. (NYSE:CEM) announces additional supplies of hydroxylamine are now anticipated ahead of the second half 2001 timeframe reported in their recent earnings release and conference call. Hydroxylamine is a key ingredient in the company's patented HDA(R) residue removers produced at its subsidiary, EKC Technology Inc., and widely used in semiconductor production.
On November 2, 2000, BASF, the world's only current supplier of hydroxylamine, announced plans to expand annual production capacity of hydroxylamine at Ludwigshafen, Germany from 4,000 to 5,700 metric tons during the first quarter of 2001. The increased capacity is expected to help relieve the hydroxylamine shortage caused by the explosion on June 10 at Nissin Chemical Company, Ltd's plant in Ojima, Japan. Nissin Chemical and Honeywell International Inc. have both announced plans to construct new hydroxylamine plants in 2001, but the timing of construction and start-up of these plants is uncertain. EKC was forced to allocate its hydroxylamine-based products among customers due to the shortage and will continue to do so until adequate new capacity comes on line.
"BASF's announcement is obviously good news for ChemFirst and our semiconductor chemicals customers," said R. Michael Summerford, ChemFirst's president and COO. "Customers rely on our HDA(R) chemistries because they are the most effective cleaners in the industry. Hydroxylamine supplies coming online from BASF, Nissin, and Honeywell should insure future availability of this key material."
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