Agilent Technologies provides new method for determining trace metal impurities in semiconductor grade phosphoric acid
Contamination control in semiconductor processing is increasingly important as critical dimensions (CD) of devices continue to shrink. Particulate contamination, which can lead to device defectivity, must be minimized at each of the integrated circuit (IC) manufacturing stages. Because more than 50 percent of the yield losses in IC manufacturing are due to micro contamination, it is critical that the wafer surface is not contaminated by metallic impurities present in the acid. In order to minimize this risk, many incoming chemicals including phosphoric acid are analyzed for chemical purity.
The Agilent 7500cs ICP-MS provides the testing of difficult matrices like phosphoric acid, enabling high performance, reliability and sensitivity in trace metal analysis. Designed for semiconductor and research facilities that demand the widest elemental coverage and ultimate detection power in high purity matrices, the new 7500cs features an octopole reaction system (ORS) and ShieldTorch for interference removal in a full range of semiconductor matrices.
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Investigation with spectroscopy gives us unique insights into the composition and structure of materials. From UV-Vis spectroscopy to infrared and Raman spectroscopy to fluorescence and atomic absorption spectroscopy, spectroscopy offers us a wide range of analytical techniques to precisely characterize substances. Immerse yourself in the fascinating world of spectroscopy!
Topic World Spectroscopy
Investigation with spectroscopy gives us unique insights into the composition and structure of materials. From UV-Vis spectroscopy to infrared and Raman spectroscopy to fluorescence and atomic absorption spectroscopy, spectroscopy offers us a wide range of analytical techniques to precisely characterize substances. Immerse yourself in the fascinating world of spectroscopy!