Agilent Technologies introduces 7500cs ICP-MS for trace metal analysis and semiconductor applications
The ORS opens up new analytical possibilities for ICP-MS in the semiconductor laboratory for interference removal, while maintaining detection capability comparable to the 7500s in non-gas mode. It features an on-axis reaction cell, which effectively removes complex spectral interferences in a wide range of semiconductor matrices. Because the ORS employs simple gases, side reactions that would create new, unpredictable interferences are eliminated. This makes the ORS much easier to set up and use while all measurements are made directly on the analyte mass, giving more reliable results. Its capabilities include the following:
* removal of phosphorus- and sulfur-based interferences on Ti, Cu and Zn in phosphoric and sulfuric acid;
* low-level detection in challenging semiconductor matrices such as photoresist, VPD extracts (high silicon matrix);
* unsurpassed detection capability in the ultraclean reagents such as hydrogen peroxide, nitric acid and ultra-pure water.
The new ion lens assembly utilized in the Agilent 7500cs provides an excellent signal/background ratio and high sensitivity, allowing all analytes to be measured at ultratrace levels, resulting in part-per-trillion level of detection limits for most metals.
The 7500cs shares the same highly reliable hardware platform and open architecture sample introduction area as the Agilent 7500 Series ICP-MS, allowing easy access for maintenance and facilitating clean sample handling. The Agilent Integrated Autosampler (I-AS) is mounted directly on the ICP-MS mainframe to minimize sample transport volume and is fully enclosed to prevent sample contamination. The 7500cs configuration is also available as an upgrade to existing 7500s systems.
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