Fraunhofer FEP presents new vacuum coating processes
The Fraunhofer Institute for Electron Beam and Plasma Technology FEP presents a new and highly efficient processes for coating of large areas, such as arcPECVD (hollow cathode arc PECVD), plasma-activated high-rate evaporation using a dual crucible and the sputtering of Indium-free transparent conductive coatings. All three technologies are ready for industrial utilization.
Highly efficient vacuum coating process of Fraunhofer FEP
Fraunhofer FEP
Fraunhofer FEP in recent years advanced the deposition of niobium-doped titanium oxide layers as an Indium-free alternative for transparent conductive electrodes towards an industrially feasible and cost-efficient process. Thus, the glass refinement can be applied in a stable and reproducible process onto large-area surfaces.
Furthermore, Fraunhofer FEP has developed the arcPECVD process, a roll-to-roll low-pressure technology with very high coating rates, which can be combined easily with other vacuum processes in one web coater due to the low working pressure. Achieving a very good productivity of over 2000 nm∙m/min, barrier layer systems with an extremely high barrier property can be obtained in one pass. However, also other layers, such as siliceous interlayers for reducing layer tension in optical layer stacks have been already realized.
Introducing the dual crucible for the plasma-activated high-rate deposition Fraunhofer FEP succeeded in developing a powerful plasma process with long-term stability for coating relatively thick layers of high melting point materials in an economical way.
Other news from the department science
