Ralph R. Dammel from Merck receives the Frits Zernike Award for Microlithography
Dr. Ralph R. Dammel, the former Chief Technology Officer at AZ Electronic Materials, now with Merck Performance Materials Business of Merck KGaA, Darmstadt, Germany has been honored with the Frits Zernike Award for Microlithography during a ceremony at SPIE Advanced Lithography 2015 on February 23rd, 2015. The Frits Zernike Award is given out annually for outstanding accomplishments in microlithographic technology, especially those furthering the development of semiconductor lithographic imaging solutions. Ralph Dammel’s significant contributions on the development of photoresist, anti-reflective coatings, and directed self-assembly materials for semiconductor microlithography were highly recognized by the society, thus he was named the award recipient for 2015.
Ralph Dammel has published over 200 scientific papers in chemistry, microlithography and over 90 patent families in the field. His book “Diazonaphthoquinone-based Resists” is used as the definitive textbook on this topic. Dammel had been with AZ Electronic Materials and its predecessors since 1986 in various technology functions, including Global R&D Director and Chief Technology Officer. Following Merck’s acquisition of AZ Electronic Materials in 2014, Dammel will assume the position of Head of Technology Office Chemicals US to continuously dedicate his expertise in the developing areas of lithography and novel emerging technologies.
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