Perfluorooctanesulfonic acid

Perfluorooctanesulfonic acid is an organofluorine compound. Salts of this compound are often used as surfactants. Like other fluorocarbons the C₈F₁₇ subunit in this compound repels water, and the sulfonic acid group makes the anion polar.

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Uses

Perfluorooctanesulfonic acid is usually used as the sodium or potassium salts, referred to as perfluorooctanesulfonates (PFOS).

• PFOS was a key ingredient in Scotchgard, a fabric protector made by 3M, and numerous stain repellents. In 2000, 3M decided to reformulate Scotchgard, an effort which was finished in 2002.
• PFOS, together with PFOA, has also been used to make aqueous film forming foam (AFFF), a component of fire-fighting foams, and alcohol-type concentrate foams.
• PFOS compounds can be also found in some impregnation agents for textiles, paper, and leather; in wax, polishes, paints, varnishes, and cleaning products for general use; in metal surfaces, and carpets.
• In the semiconductor industry, PFOS is used in multiple photolithographic chemicals including: photoacid generators (PAGs) and anti-reflective coatings (ARCs). Phased out in the European Union semiconductor industry due to health concerns.

Safety

Perfluorooctanesulfonates are persistent organic pollutants. It is exceptionally stable in the environment. In 1997, low levels of PFOS were found in tissues of polar bears, dolphins, albatrosses, and blood samples from people worldwide. PFOS is considered toxic through experiments done on rats.^[1]

See also

• Perfluorooctanoic acid

References

1. ^ C. Lau, J. R. Thibodeaux, R. G. Hanson, J. M. Rogers, B. E. Grey, M. E. Stanton, J. L. Butenhoff and L. A. Stevenson (2003). "Exposure to Perfluorooctane Sulfonate during Pregnancy in Rat and Mouse. II: Postnatal Evaluation". Toxicol. Sci. 74 (2): 382-392. doi:10.1093/toxsci/kfg122.

• J. W. Martin, M. M. Smithwick, B. M. Braune, P. F. Hoekstra, D. C. G. Muir and S. A. Mabury (2004). "Identification of Long-Chain Perfluorinated Acids in Biota from the Canadian Arctic". Environ. Sci. Technol.. doi:10.1021/es034727+.