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350 nanometer

CMOS manufacturing
processes

10 µm
3 µm
1.5 µm
1 µm
800 nm (0.80 µm)
600 nm (0.60 µm)
350 nm (0.35 µm)
250 nm (0.25 µm)
180 nm (0.18 µm)
130 nm (0.13 µm)
90 nm
65 nm
45 nm
32 nm
22 nm
16 nm

The 350 nanometer (350 nm or 0.35 µm) process refers to the level of semiconductor process technology that was reached in the 1995-1996 timeframe, by most leading semiconductor companies, like Intel and IBM.

Products featuring 350 nm manufacturing process

Intel Pentium Pro CPU launched in late 1995 was manufactured using this process.
The original (Model 6) AMD K6 CPU launched on April 2, 1997

Additional recommended knowledge

Essential Laboratory Skills Guide

What is the Sensitivity of my Balance?

Safe Weighing Range Ensures Accurate Results

Preceded by 600 nm	CMOS manufacturing processes	Succeeded by 250 nm

Categories: Condensed matter physics | International Technology Roadmap for Semiconductors lithography nodes

This article is licensed under the GNU Free Documentation License. It uses material from the Wikipedia article "350_nanometer". A list of authors is available in Wikipedia.

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